全频段亚纳米精度氟化钙材料加工

发布时间：2018-05-25 17:15

本文选题：氟化钙 + 投影光刻物镜　；参考：《光学精密工程》2016年11期

【摘要】：考虑用CaF_2材料制作投影光刻物镜可以明显提高其性能指标,本文研究了CaF_2材料加工工艺的全流程,以实现CaF_2材料的全频段高精度加工。首先,利用沥青抛光膜和金刚石微粉使CaF_2元件有较好的面形和表面质量。然后,优化转速、抛光盘移动范围、压力等加工工艺参数,并使用硅溶胶溶液抛光进一步降低CaF_2元件的高频误差,逐渐去除加工中产生的划痕并且获得极小中频误差(Zernike残差)和高频粗糙度。最后,在不改变CaF_2元件高频误差的同时利用离子束加工精修元件面形。对100mm口径氟化钙材料平面进行了加工和测试。结果表明:其Zernike 37项拟合面形误差RMS值可达0.39nm,Zernike残差RMS值为0.43nm,高频粗糙度均值为0.31nm,实现了对CaF_2元件的亚纳米精度加工,为研发高性能深紫外投影光刻物镜奠定了良好基础。
[Abstract]:It is considered that using CaF_2 material to make projection lithography objective lens can obviously improve its performance index. In this paper, the whole process of CaF_2 material processing technology is studied in order to realize the high precision processing of CaF_2 material in full frequency band. Firstly, the surface shape and surface quality of CaF_2 elements are improved by using asphalt polishing film and diamond powder. Then, the processing parameters such as rotation speed, moving range and pressure are optimized, and the high frequency error of CaF_2 element is further reduced by using silica sol solution polishing. The scratches produced in the process are gradually removed and the minimum if error Zernike residuals are obtained) and the high frequency roughness is obtained. Finally, the high frequency error of CaF_2 element is not changed, and the surface shape of the element is processed by ion beam. The plane of 100mm caliber calcium fluoride was processed and tested. The results show that the RMS value of Zernike 37 fitting surface error can reach 0.39 nm Zernike residual RMS value and the mean value of high frequency roughness is 0.31 nm. The subnanometer precision processing of CaF_2 element is realized, which lays a good foundation for the research and development of high performance deep ultraviolet projection lithography objective lens.
【作者单位】：中国科学院长春光学精密机械与物理研究所超精密光学工程研究中心;
【基金】：国家科技重大专项(No.2009ZX02205)
【分类号】：TH74

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