钜泉诉锐能微侵犯集成电路布图设计专有权案研究

发布时间：2018-03-02 02:18

本文关键词： 布图设计侵权判定抗辩事由独创性　出处：《湖南师范大学》2015年硕士论文　论文类型：学位论文

【摘要】：2014年9月判决的钜泉诉锐能微侵犯集成电路布图设计专有权案是我国现有为数不多的典型集成电路布图设计专有权侵权案,它全方位体现了集成电路布图设计专有权侵权领域内司法判断的最新动态。本文结合案例,从集成电路布图设计复制侵权的认定和抗辩事由两个方面,对集成电路布图设计的侵权判定标准和独创性认定这两个具有一定争议性的问题进行了评价和法理分析。对集成电路布图设计的复制侵权的判定标准一直是集成电路布图设计专有权案中最主要的争议焦点,要给出复制侵权的判定标准,必须对集成电路布图设计和集成电路布图设计复制侵权的特征以及法律保护模式进行分析研究,同时区分完全复制侵权和部分复制侵权,且对这两种情况并进行分类讨论,其中又以部分复制侵权为主要讨论对象。本文在此案例的基础上,结合美国等发达国家的法律规定和典型司法案例,对部分复制侵权的“质”和“量”两个维度与“实质性相似”和“独创性标准”两个判定标准的关系做出了一定探索。集成电路布图设计复制侵权有两个主要抗辩事由:集成电路布图设计的独创性和反向工程。独创性是集成电路布图设计纳入法律保护范围的一个重要标准,作为一个整体的布图设计如果不具有独创性则不受法律保护,如果一个布图设计具有独创性,即使存在复制也不构成侵权;同时布图设计的反向工程作为一种特殊的合法抗辩事由,其成立要件也落在其独创性上,故集成电路复制侵权的判断和对反向工程的成立判断都离不开对布图设计的独创性的判定。集成电路布图设计的独创性具有一定的特殊性,这使布图设计在独创性举证责任和布图设计的样本比较等司法程序中也具有一定的特殊性。本文从该案出发,结合法学理论和法律规定,对集成电路布图设计复制侵权的侵权标准和独创性判定做了深入分析和完善建议,并试图给出一个简化的布图设计侵权判定的流程,将布图设计的复制侵权判断和独创性认定以及反向工程问题三者的内在逻辑关系图表化,试求对集成电路布图设计复制侵权的认定提供一定的指导。
[Abstract]:In September 2014, the case of Ju Quan v. Rui Neng micro-infringing the exclusive right of integrated circuit layout design is one of the few typical integrated circuit layout design exclusive rights infringement cases in our country. It reflects the latest development of judicial judgment in the field of exclusive right infringement of integrated circuit layout design. This paper evaluates and analyzes the two controversial issues of infringement judgment standard and originality determination of integrated circuit layout-design. The judgment standard of copying infringement of integrated circuit layout-design is always integrated. The main controversy in the circuit layout design exclusive right case, In order to give the judgment standard of copying infringement, it is necessary to analyze and study the characteristics and legal protection mode of integrated circuit layout design and integrated circuit layout design duplication infringement, and at the same time distinguish between complete copy infringement and partial copy infringement. And the two cases are classified and discussed, in which part of the duplication infringement is the main object of discussion. Based on this case, this paper combines the legal provisions of the United States and other developed countries and typical judicial cases. The relationship between the two dimensions of "quality" and "quantity" of partial reproduction infringement and the two criteria of "substantial similarity" and "originality standard" is explored. There are two main resistance to the infringement of copying in layout design of integrated circuits. Argument: originality and reverse engineering of integrated circuit layout design. Originality is an important standard for integrated circuit layout design to be brought into the scope of legal protection. The layout-design as a whole is not protected by law if it is not original, and if a layout-design has originality, even if there is duplication, it does not constitute infringement. At the same time, the reverse engineering of layout-design, as a special legal defense, also falls on its originality. Therefore, the judgment of the infringement of integrated circuit replication and the establishment of reverse engineering cannot be separated from the judgement of originality of layout-design, and the originality of layout-design of integrated circuit has its own particularity. This makes layout-design have some particularity in judicial procedure, such as originality burden of proof and sample comparison of layout-design. This paper makes a thorough analysis and improvement of the infringement standard and original judgment of the layout design infringement of integrated circuit, and tries to give a simplified flow chart of the layout design infringement judgment. This paper attempts to provide some guidance for the identification of the copyright infringement of integrated circuit layout-design by graphing the inherent logical relationship among the reproducing infringement judgment and originality of layout-design and reverse engineering problem.
【学位授予单位】：湖南师范大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：D923.42

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